2017美國工程院士傑出講座(台大竹北)

日    期: 6月15日(星期四) 13:10~15:30
地    點: 臺灣大學竹北校區碧禎館107會議室 (新竹縣竹北市莊敬一路88)
講    師: David Y.H.Pui (裴有康)
Distinguished McKnight University Professor and LM Fingerson/TSI Inc Chair in Mechanical Engineering. University of Minnesota
Member of the US National Academy of Engineering (NAE) (美國國家工程學院院士)
講    題:Ultra-Clean Environment for Advanced Semiconductor Manufacturing Processes: Liquid and Air Filtration for
sub-20 nm particles; Protection Schemes for EUVL systems; Real-time AMC Detection in Cleanroom


議    程:

13:10-13:20 報    到
13:20-13:30 主持人致詞:胡石政   台北科技大學特聘教授
13:30-15:30 Ultra-Clean Environment for Advanced Semiconductor Manufacturing Processes: Liquid and Air Filtration for sub-20 nm particles; Protection Schemes for EUVL systems; Real-time AMC Detection in Cleanroom

Abstract
Ultra-clean environment for advanced semiconductor manufacturing processes requires the use of ultra-sensitive detectors and measuring techniques to monitor the processes and to evaluate various contamination control schemes. The Particle Technology Laboratory (PTL) has developed many instruments and samplers to perform these measurements, which helped to establish ISO standards and industry practice. Our research has led to the development of the ISO standard for aerosol particle number concentration and for determining particle size distribution. We have also helped National Institute of Standards and Technology (NIST) in establishing the 60 nm and 100 nm particle standards. Filtration is the principal means to control contamination in cleanroom and clean processes environment.
The Center for Filtration Research (CFR) at the University of Minnesota, consisting of 18 leading international filtration companies, was established to find filtration solutions to mitigate cleanroom and environmental pollutants. CFR investigators perform fundamental and applied research on air, gas and liquid filtration. Fundamental research in measuring and filtering sub-20 nm particles in liquid and in air will be presented. Extreme ultraviolet lithography (EUVL) is a leading lithographic technology for the next generation of semiconductor chips. We have developed techniques to protect the EUV photomasks from contamination during all handling steps, including shipping and storage at atmospheric pressure as well as during exposure in dedicated lithography tools at low pressure down to 20 mTorr. These protection schemes were modeled and validated experimentally. Finally, airborne molecular contamination (AMC), consisting of volatile organic compounds (VOCs), can reduce the production yield of semiconductor chips by forming nanoparticles and haze on silicon wafers and photomasks under ultraviolet irradiation during photolithography processes. We have developed a real-time and online method to screen materials for potential VOCs outgassing down to ppt level. An example of detecting the VOCs outgassing from the PM2.5 particles deposited on the HVAC pre-filters for the cleanroom will be presented.

Speaker Biography
David
Professor David Y. H. Pui is a Distinguished McKnight University Professor and LM Fingerson/TSI Inc Chair in Mechanical Engineering at the University of Minnesota. He is a Member of the US National Academy of Engineering (NAE) and Director of the world-renowned Particle Technology Laboratory (PTL) at the University of Minnesota. He is also the Director of the Center for Filtration Research (CFR) with 18 leading international filtration companies as members. Dr. Pui has a broad range of research experience in aerosol and nanoparticle science and filtration technology and has over 270 journal papers and 30 patents. His research interest has focused on industrial applications of aerosol science and technology and nanoparticle engineering, and on developing instrumentation for generating, sampling and measuring airborne particles. He has developed several widely used commercial aerosol instruments and several protection schemes for EUVL systems. Dr. Pui has received many awards, including the Max Planck Research Award (1993), the Humboldt Research Award for Senior U.S. Scientists (2000), the Fuchs Memorial Award (2010) – the highest disciplinary award conferred jointly by the American, German and Japanese Aerosol Associations, and the Einstein Professorship Award (2013) by the Chinese Academy of Sciences (CAS).

贊    助 Sponsors:科技部 大金能源
主    辦 Host:國立臺北科技大學潔淨技術研發中心、交通大學pm2.5聯盟
協    辦 Co-host:台大高科技廠房設施研究中心、中華潔淨技術協會

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